Invention Grant
- Patent Title: Defect detection apparatus and defect detection method
- Patent Title (中): 缺陷检测装置和缺陷检测方法
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Application No.: US11203147Application Date: 2005-08-15
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Publication No.: US07646908B2Publication Date: 2010-01-12
- Inventor: Hiroyuki Onishi
- Applicant: Hiroyuki Onishi
- Applicant Address: JP Kyoto
- Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee: Dainippon Screen Mfg. Co., Ltd.
- Current Assignee Address: JP Kyoto
- Agency: McDermott Will & Emery LLP
- Priority: JPP2004-283122 20040929
- Main IPC: G06K9/00
- IPC: G06K9/00

Abstract:
A defect detection apparatus (1) comprises an image pickup part (3) for picking up an image of a substrate (9) to acquire a grayscale target image, from which pixel values of the target image are sequentially outputted to a defect detector (43). The defect detector (43) compares the target image with a reference image to generate a defect region image representing regions of defects included in a plurality of predetermined inspection regions, to be stored in a defect region image memory (44). A computer (5) obtains an area and a barycentric position of each of the defects in the defect region image to specify an inspection region including the defect and performs limitation (i.e., selection) of defects on the basis of a defect detection condition set for each inspection region on the area of defect. It is possible to detect defects with high efficiency by using a defect detection condition on a different area of defect for each inspection region.
Public/Granted literature
- US20060067571A1 Defect detection apparatus and defect detection method Public/Granted day:2006-03-30
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