Invention Grant
- Patent Title: Micromechanical device and method for producing a micromechanical device
- Patent Title (中): 微机械装置及其制造方法
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Application No.: US11600672Application Date: 2006-11-15
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Publication No.: US07647832B2Publication Date: 2010-01-19
- Inventor: Joerg Muchow , Hubert Benzel , Markus Lang , Regina Grote , Simon Armbruster , Gerhard Lammel , Christoph Schelling , Volkmar Senz
- Applicant: Joerg Muchow , Hubert Benzel , Markus Lang , Regina Grote , Simon Armbruster , Gerhard Lammel , Christoph Schelling , Volkmar Senz
- Applicant Address: DE Stuttgart
- Assignee: Robert Bosch GmbH
- Current Assignee: Robert Bosch GmbH
- Current Assignee Address: DE Stuttgart
- Agency: Kenyon & Kenyon LLP
- Priority: DE102005055473 20051122
- Main IPC: G01L7/00
- IPC: G01L7/00 ; G01P15/00

Abstract:
A micromechanical device and a method for producing this device are provided, the device having a sensor pattern that includes a spring pattern and a seismic mass. The seismic mass may be connected to the substrate material via the spring pattern, and a clearance may be provided in a direction perpendicular to the major substrate plane between the spring pattern and the substrate material. Alternatively, the spring pattern and the seismic mass may have a common, essentially continuous, front side surface.
Public/Granted literature
- US20070126069A1 Micromechanical device and method for producing a micromechanical device Public/Granted day:2007-06-07
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