Invention Grant
- Patent Title: Liquid jet head and its manufacturing method
- Patent Title (中): 液体喷头及其制造方法
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Application No.: US11831178Application Date: 2007-07-31
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Publication No.: US07648229B2Publication Date: 2010-01-19
- Inventor: Hiromu Miyazawa , Masao Nakayama
- Applicant: Hiromu Miyazawa , Masao Nakayama
- Applicant Address: JP
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP
- Agency: Harness, Dickey & Pierce, P.L.C.
- Priority: JP2006-211111 20060802; JP2006-316720 20061124
- Main IPC: B41J2/045
- IPC: B41J2/045

Abstract:
A liquid jet head includes: a substrate; a pressure generation chamber provided in the substrate; an elastic plate provided above the substrate; a capacitor structure section provided above the elastic plate, the capacitor structure section including a lower electrode layer, a piezoelectric layer and an upper electrode layer; a porous layer provided above the capacitor structure section; a seal layer provided on the porous layer; and a void section formed between the capacitor structure section and the porous layer.
Public/Granted literature
- US20080030551A1 LIQUID JET HEAD AND ITS MANUFACTURING METHOD Public/Granted day:2008-02-07
Information query
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