Invention Grant
- Patent Title: Baffle plate, apparatus for producing the same, method of producing the same, and gas processing apparatus containing baffle plate
- Patent Title (中): 挡板，其制造方法，制造方法以及包含挡板的气体处理装置
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Application No.: US10168451Application Date: 2000-12-21
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Publication No.: US07648610B2Publication Date: 2010-01-19
- Inventor: Taro Komiya , Hatsuo Osada , Shigetoshi Hosaka , Tomihiro Yonenaga , Masayuki Tomoyasu
- Applicant: Taro Komiya , Hatsuo Osada , Shigetoshi Hosaka , Tomihiro Yonenaga , Masayuki Tomoyasu
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Pillsbury Winthrop Shaw Pittman, LLP
- Priority: JP11/368473 19991224
- International Application: PCT/JP00/09106 WO 20001221
- International Announcement: WO01/48790 WO 20010507
- Main IPC: H01L21/3065
- IPC: H01L21/3065 ; H01L21/306 ; C23C16/00 ; C23C16/455
Abstract:
The present invention provides a gas process apparatus that realizes uniform exhaust without depending on process conditions, a gas process chamber that constitutes the gas process apparatus, a baffle plate mounted on the gas process chamber, a method of producing the baffle plate, and an apparatus for producing the baffle plate. The baffle plate of the present invention serves as a partition between a process space in which a chemical process is carried out with a supplied gas, and a duct that is adjacent to the process space and functions to discharge exhaust gas generated as a result of the chemical process. In accordance with the difference between the pressures on both sides of the baffle plate, which difference varies depending on the location on the baffle plate, the baffle holes are disposed on a plurality of locations on the baffle plate.
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