Invention Grant
US07648689B2 Process for the production of InP fine particles and InP fine particle dispersion obtained by the process
失效
通过该方法制备的InP微粒和InP微粒分散体的制备方法
- Patent Title: Process for the production of InP fine particles and InP fine particle dispersion obtained by the process
- Patent Title (中): 通过该方法制备的InP微粒和InP微粒分散体的制备方法
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Application No.: US11666227Application Date: 2006-03-10
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Publication No.: US07648689B2Publication Date: 2010-01-19
- Inventor: Shuzo Tokumitsu
- Applicant: Shuzo Tokumitsu
- Applicant Address: JP Tokyo
- Assignee: Hoya Corporation
- Current Assignee: Hoya Corporation
- Current Assignee Address: JP Tokyo
- Agency: Nixon & Vanderhye, P.C.
- Priority: JP2005-083707 20050323
- International Application: PCT/JP2006/305312 WO 20060310
- International Announcement: WO2006/101015 WO 20060928
- Main IPC: B22F1/00
- IPC: B22F1/00 ; B22F9/00 ; C21B15/04 ; C22B3/00 ; H01L21/00 ; H01L21/28 ; C09K3/00 ; C01B25/00 ; C01B33/26 ; C01G31/00 ; C01G28/00 ; C30B23/00

Abstract:
The invention is to provide a process for industrially advantageously producing InP fine particles having a nano-meter size efficiently in a short period of time and an InP fine particle dispersion, and there are provided a process for the production of InP fine particles by reacting an In raw material containing two or more In compounds with a P raw material containing at least one P compound in a solvent wherein the process uses, as said two or more In compounds, at least one first In compound having a group that reacts with a functional group of P compound having a P atom adjacent to an In atom to be eliminated with the functional group in the formation of an In-P bond and at least one second In compound having a lower electron density of In atom in the compound than said first In compound and Lewis base solvent as said solvent, and InP fine particles obtained by the process.
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