- Patent Title: Mask, method of manufacturing mask, device for manufacturing mask, method of manufacturing layer of luminescent material, electro-optical device, and electronic device
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Application No.: US10782947Application Date: 2004-02-23
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Publication No.: US07648729B2Publication Date: 2010-01-19
- Inventor: Makoto Nakadate
- Applicant: Makoto Nakadate
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2003-061355 20030307; JP2003-061356 20030307; JP2003-061357 20030307; JP2004-036621 20040213
- Main IPC: B05D5/06
- IPC: B05D5/06
Abstract:
This mask includes: a substrate in which an aperture is formed; a mask member which, along with being formed with a plurality of through holes, is joined to the substrate in correspondence to the aperture; and spacers which hold the substrate and the mask member with a predetermined gap between them.
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