Invention Grant
US07648802B2 Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems
失效
用于表征成像光学系统中的照明和掩模质量的相移测试掩模图案
- Patent Title: Phase shifting test mask patterns for characterizing illumination and mask quality in image forming optical systems
- Patent Title (中): 用于表征成像光学系统中的照明和掩模质量的相移测试掩模图案
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Application No.: US11053725Application Date: 2005-02-07
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Publication No.: US07648802B2Publication Date: 2010-01-19
- Inventor: Andrew R. Neureuther , Gregory R. McIntyre
- Applicant: Andrew R. Neureuther , Gregory R. McIntyre
- Applicant Address: US CA Oakland
- Assignee: The Regents of the University of California
- Current Assignee: The Regents of the University of California
- Current Assignee Address: US CA Oakland
- Agency: Withrow & Terranova, P.L.L.C.
- Main IPC: G03F1/00
- IPC: G03F1/00 ; G06K9/00 ; G01B11/24 ; G03C5/00
Abstract:
The present invention presents three new classes of phase-shifting mask patterns. In optical image forming systems, a mask with phase shifted regions can act as a precision instrument for characterizing imaging. Three new classes of phase-shifting mask patterns have been invented to characterize projection printing tool illumination and phase-shifting mask (PSM) performance. The linear phase grating (LPG) and linear phase ring (LPR) both serve to characterize illumination angular distribution and uniformity. A third new class, the interferometric-probe monitor for phase-shifting masks (IPM-PSM), measures the effective phase, transmittance and edge effects of various phase-shifted mask features. All three patterns allow performance comparison across the field, tool-to-tool, over time, or to intended design.
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