• Patent Title: Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate
  • Application No.: US12187052
    Application Date: 2008-08-06
  • Publication No.: US07648807B2
    Publication Date: 2010-01-19
  • Inventor: Yasushi Okubo
  • Applicant: Yasushi Okubo
  • Applicant Address: JP Tokyo
  • Assignee: Hoya Corporation
  • Current Assignee: Hoya Corporation
  • Current Assignee Address: JP Tokyo
  • Agency: Sughrue Mion, PLLC
  • Priority: JP2007-204922 20070807
  • Main IPC: G03F9/00
  • IPC: G03F9/00
Mask blank substrate manufacturing method, mask blank manufacturing method, mask manufacturing method, and mask blank substrate
Abstract:
An object of this invention is to properly identify or manage mask blank substrates, mask blanks, and so on. A manufacturing method of a mask blank substrate (10) includes a substrate preparing step of preparing a plate-like substrate with a square main surface (102), and a marker forming step of forming a marker (106a to 106d) for identifying or managing the substrate on each of at least a plurality of end faces among four end faces (104a to 104d) of the substrate. The four end faces are continuous with sides of the main surface, respectively.
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