Invention Grant
- Patent Title: Pattern forming method
- Patent Title (中): 图案形成方法
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Application No.: US12268699Application Date: 2008-11-11
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Publication No.: US07648813B2Publication Date: 2010-01-19
- Inventor: Mitsunaga Saito , Yasushi Shinjiyo , Yoshihiro Tajima , Koichi Ishii , Masahiro Hosoya , Ken Takahashi
- Applicant: Mitsunaga Saito , Yasushi Shinjiyo , Yoshihiro Tajima , Koichi Ishii , Masahiro Hosoya , Ken Takahashi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-134022 20060512
- Main IPC: G03G13/045
- IPC: G03G13/045

Abstract:
By using an intaglio plate for holding a pattern formed by a developing agent, a transfer device for transferring patterns developed on the intaglio plate to a transfer object medium, and a baking chamber for eliminating an electrode layer after transfer or heightening resistance thereof, the patterns developed on the intaglio plate are transferred onto the electrode layer disposed at the opposite side of the transfer object medium, and then heated in the baking chamber, whereby the electrode layer is eliminated or heightened in resistance.
Public/Granted literature
- US20090123855A1 PATTERN FORMING METHOD Public/Granted day:2009-05-14
Information query
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