Invention Grant
- Patent Title: Positive working resist composition and pattern forming method
- Patent Title (中): 正性抗蚀剂组成和图案形成方法
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Application No.: US12037135Application Date: 2008-02-26
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Publication No.: US07648817B2Publication Date: 2010-01-19
- Inventor: Takayuki Kato , Akinori Shibuya
- Applicant: Takayuki Kato , Akinori Shibuya
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2007-047554 20070227
- Main IPC: G03F7/004
- IPC: G03F7/004 ; G03F7/30 ; C08F8/34 ; C08F220/28 ; C08F2/42
Abstract:
A positive working resist composition comprises a specific resin. The specific resin comprises: a repeating unit having a first specific group; and a repeating unit having a second specific group, the first specific group being different from the second specific group; and a specific structure in an end terminal of the resin. The specific resin decomposes by action of an acid to increase its solubility in an alkaline developer.
Public/Granted literature
- US20080206669A1 POSITIVE WORKING RESIST COMPOSITION AND PATTERN FORMING METHOD Public/Granted day:2008-08-28
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