Invention Grant
US07648942B2 Process for preparing metal or metal alloy nanoparticles dispersed on a substrate by chemical vapour deposition
有权
通过化学气相沉积分散在基体上的金属或金属合金纳米颗粒的制备方法
- Patent Title: Process for preparing metal or metal alloy nanoparticles dispersed on a substrate by chemical vapour deposition
- Patent Title (中): 通过化学气相沉积分散在基体上的金属或金属合金纳米颗粒的制备方法
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Application No.: US11793888Application Date: 2005-12-23
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Publication No.: US07648942B2Publication Date: 2010-01-19
- Inventor: Stéphanie Thollon , Fabien Luc , Joël Barrault , Sabine Valange , Erwan Guelou , Marco Daturi , Fabien Can
- Applicant: Stéphanie Thollon , Fabien Luc , Joël Barrault , Sabine Valange , Erwan Guelou , Marco Daturi , Fabien Can
- Applicant Address: FR Paris FR Paris FR Poiters Cedex
- Assignee: Commissariat a l'Energie Atomique,Centre National de la Recherche Scientifique,Universite de Poiters
- Current Assignee: Commissariat a l'Energie Atomique,Centre National de la Recherche Scientifique,Universite de Poiters
- Current Assignee Address: FR Paris FR Paris FR Poiters Cedex
- Agency: Brinks Hofer Gilson & Lione
- Priority: FR0453179 20041223
- International Application: PCT/FR2005/003264 WO 20051223
- International Announcement: WO2006/070130 WO 20060706
- Main IPC: B01J23/50
- IPC: B01J23/50 ; B01J23/66 ; B05D5/12 ; B05D1/12
Abstract:
Process of depositing nanoparticles of a metal or of an alloy of said metal, said metal being chosen from the metals from columns VIIIB and IB of the Periodic Table, dispersed on a substrate by chemical vapour deposition (CVD), from one or more precursors, in which the deposition is carried out in the presence of a gas comprising more than 50 vol % of a reactive oxidizing gas.Substrate comprising at least one surface, dispersed on which are nanoparticles made of a metal or of an alloy of metals, for example made of silver or a silver alloy.Use of the substrate to catalyse a chemical reaction, for example an NOx elimination reaction.
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