Invention Grant
- Patent Title: Transfer method and transfer apparatus
- Patent Title (中): 转移方法和转运装置
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Application No.: US11380280Application Date: 2006-04-26
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Publication No.: US07648944B2Publication Date: 2010-01-19
- Inventor: Keisuke Matsuo , Eisuke Matsuda
- Applicant: Keisuke Matsuo , Eisuke Matsuda
- Applicant Address: JP Tokyo
- Assignee: Sony Corporation
- Current Assignee: Sony Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sonnenschein Nath & Rosenthal LLP
- Priority: JPP2005-128908 20050427; JPP2005-168018 20050608
- Main IPC: B41M5/035
- IPC: B41M5/035 ; B41M5/50

Abstract:
A transfer method includes the steps of placing a donor substrate including a support base and a transfer layer provided on the support base onto a receptor substrate such that the transfer layer faces the receptor substrate, evacuating a space between the receptor substrate and the donor substrate that are placed one on the other, and transferring the transfer layer onto the receptor substrate by applying a radiant ray onto the donor substrate in an evacuated atmosphere.
Public/Granted literature
- US20060243377A1 TRANSFER METHOD AND TRANSFER APPARATUS Public/Granted day:2006-11-02
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