Invention Grant
- Patent Title: Charged particle beam equipment with magnification correction
- Patent Title (中): 充电粒子束设备放大校正
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Application No.: US11798770Application Date: 2007-05-16
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Publication No.: US07649172B2Publication Date: 2010-01-19
- Inventor: Masaru Ozawa , Hiromi Inada , Daisuke Terauchi , Hiroyuki Tanaka
- Applicant: Masaru Ozawa , Hiromi Inada , Daisuke Terauchi , Hiroyuki Tanaka
- Applicant Address: JP Tokyo
- Assignee: Hitachi High-Technologies Corporation
- Current Assignee: Hitachi High-Technologies Corporation
- Current Assignee Address: JP Tokyo
- Agency: Crowell & Moring LLP
- Priority: JP2006-136289 20060516
- Main IPC: H01J37/26
- IPC: H01J37/26 ; G01N13/12

Abstract:
Charged particle beam equipment enables the simultaneous measurement and correction of magnification errors in both X and Y directions in one measurement without requiring the elimination of displacement, if any, in rotation direction between the direction of a periodic structure pattern of a sample having a known periodic structure and the X or Y direction on an electron image of the sample. The charged particle beam equipment of the invention enables the simultaneous measurement of magnification errors in the X and Y directions by FFT transformation and coordinate transformation of an electron image, even when there is a displacement in rotation direction between the direction of the periodic structural pattern and the X or Y direction on the electron image of the sample.
Public/Granted literature
- US20080067380A1 Charged particle beam equipment Public/Granted day:2008-03-20
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