Invention Grant
- Patent Title: Processing method and system
- Patent Title (中): 处理方法和系统
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Application No.: US10794500Application Date: 2004-03-05
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Publication No.: US07649184B2Publication Date: 2010-01-19
- Inventor: Eigo Kawakami
- Applicant: Eigo Kawakami
- Applicant Address: JP
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2003-062338 20030307
- Main IPC: G01N23/10
- IPC: G01N23/10 ; C23C16/00

Abstract:
A processing method uses a processing system which includes an atmosphere replacing chamber having first and second gate valves, and a container that has an inside maintained in a reduced pressure or vacuum atmosphere and provides a predetermined process to an object, wherein the atmosphere replacing chamber is connected to the container through the first gate valve and a space different from the container through the second gate valve. The processing method includes the steps of exhausting the atmosphere replacing chamber while introducing first gas below predetermined humidity to the atmosphere replacing chamber, and vacuum-pumping the atmosphere replacing chamber after said exhausting step, by reducing an amount of the first gas to be introduced into the atmosphere replacing chamber.
Public/Granted literature
- US20040222383A1 Processing method and system Public/Granted day:2004-11-11
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