Invention Grant
US07649186B2 Extreme UV radiation focusing mirror and extreme UV radiation source device
有权
极紫外辐射聚焦镜和极紫外线辐射源装置
- Patent Title: Extreme UV radiation focusing mirror and extreme UV radiation source device
- Patent Title (中): 极紫外辐射聚焦镜和极紫外线辐射源装置
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Application No.: US11736866Application Date: 2007-04-18
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Publication No.: US07649186B2Publication Date: 2010-01-19
- Inventor: Kiyoyuki Kabuki , Hiroto Sato
- Applicant: Kiyoyuki Kabuki , Hiroto Sato
- Applicant Address: JP Tokyo
- Assignee: Ushiodenki Kabushiki Kaisha
- Current Assignee: Ushiodenki Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Roberts Mlotkowski Safran & Cole, P.C.
- Agent David S. Safran
- Priority: JP2006-114219 20060418
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G21G4/00

Abstract:
In an EUV focusing mirror in which there are several thin concave nested high precision mirrors in the form of an ellipsoid of revolution, a paraboloid of revolution, a Wolter type or the like, the sides which do not constitute the reflection surfaces are made in the shape of a knife edge at the radiation incident ends of the respective mirrors in order not to be shielded by the thickness of the radiation incidence sides of the respective mirrors. Likewise, the radiation exit ends of the respective mirrors are made in the form of a knife edge. This yields an advantageous far-field distribution use of the mirrors for an EUV radiation source device and the degree of reduction of the light intensity can be made smaller than in the conventional case.
Public/Granted literature
- US20080121824A1 EXTREME UV RADIATION FOCUING MIRROR AND EXTREME UV RADIATION SOURCE DEVICE Public/Granted day:2008-05-29
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