Invention Grant
- Patent Title: Forming a carbon layer between phase change layers of a phase change memory
- Patent Title (中): 在相变存储器的相变层之间形成碳层
-
Application No.: US11899862Application Date: 2007-09-07
-
Publication No.: US07649191B2Publication Date: 2010-01-19
- Inventor: Wolodymyr Czubatyj , Sergey Kostylev , Tyler A. Lowrey , Guy C. Wicker
- Applicant: Wolodymyr Czubatyj , Sergey Kostylev , Tyler A. Lowrey , Guy C. Wicker
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Trop, Pruner & Hu, P.C.
- Main IPC: H01L47/00
- IPC: H01L47/00

Abstract:
A carbon containing layer may be formed between a pair of chalcogenide containing layers of a phase change memory. When the lower chalcogenide layer allows current to pass, a filament may be formed therein. The filament then localizes the electrical heating of the carbon containing layer, converting a relatively localized region to a lower conductivity region. This region then causes the localization of heating and current flow through the upper phase change material layer. In some embodiments, less phase change material may be required to change phase to form a phase change memory, reducing the current requirements of the resulting phase change memory.
Public/Granted literature
- US20070297213A1 Forming a carbon layer between phase change layers of a phase change memory Public/Granted day:2007-12-27
Information query
IPC分类: