Invention Grant
- Patent Title: Nano-array and fabrication method thereof
- Patent Title (中): 纳米阵列及其制造方法
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Application No.: US11509660Application Date: 2006-08-25
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Publication No.: US07649198B2Publication Date: 2010-01-19
- Inventor: Chih-Chiang Chao , Po-Ling Shiao , Mei-Chun Lai
- Applicant: Chih-Chiang Chao , Po-Ling Shiao , Mei-Chun Lai
- Applicant Address: TW Hsinchu
- Assignee: Industrial Technology Research Institute
- Current Assignee: Industrial Technology Research Institute
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW94146967A 20051228
- Main IPC: H01L35/24
- IPC: H01L35/24
Abstract:
The invention provides a method for fabricating a nano-array comprising the following steps. A template with a plurality of nano-holes is provided. A polymer is embossed by the template to integrally form a plurality of nano-protrusions thereon, and demolding to reveal the nano-protrusions. The nano-protrusion has a concave or convex top surface.
Public/Granted literature
- US20070148815A1 Nano-array and fabrication method thereof Public/Granted day:2007-06-28
Information query
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