Invention Grant
US07649199B2 N-type semiconductor materials in thin film transistors and electronic devices
有权
薄膜晶体管和电子器件中的N型半导体材料
- Patent Title: N-type semiconductor materials in thin film transistors and electronic devices
- Patent Title (中): 薄膜晶体管和电子器件中的N型半导体材料
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Application No.: US12101179Application Date: 2008-04-11
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Publication No.: US07649199B2Publication Date: 2010-01-19
- Inventor: Deepak Shukla , Thomas R. Welter
- Applicant: Deepak Shukla , Thomas R. Welter
- Applicant Address: US NY Rochester
- Assignee: Eastman Kodak Company
- Current Assignee: Eastman Kodak Company
- Current Assignee Address: US NY Rochester
- Agent J. Lanny Tucker
- Main IPC: H01L51/00
- IPC: H01L51/00 ; C07D471/02

Abstract:
A thin film transistor comprises a layer of organic semiconductor that comprises an N,N′-1,4,5,8-naphthalenetetracarboxylic acid diimide having at least one cycloalkyl group having a fluorinated substituent at its 4-position that adopts an equatorial orientation in the trans configuration of the cycloalkyl group and an axial orientation in the cis configuration of the cycloalkyl group. Such transistors can be a field effect transistor having a dielectric layer, a gate electrode, a source electrode and a drain electrode. The gate electrode and the thin film of organic semiconductor material both contact the dielectric layer, and the source electrode and the drain electrode both contact the thin film of organic semiconductor material.
Public/Granted literature
- US20090256137A1 N-TYPE SEMICONDUCTOR MATERIALS IN THIN FILM TRANSISTORS AND ELECTRONIC DEVICES Public/Granted day:2009-10-15
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