Invention Grant
- Patent Title: Sequential lateral solidification mask
- Patent Title (中): 顺序侧面凝固掩模
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Application No.: US11450413Application Date: 2006-06-12
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Publication No.: US07649206B2Publication Date: 2010-01-19
- Inventor: Mao-Yi Chang , Chih-Hsiung Chang
- Applicant: Mao-Yi Chang , Chih-Hsiung Chang
- Applicant Address: TW Hsinchu
- Assignee: AU Optronics Corp.
- Current Assignee: AU Optronics Corp.
- Current Assignee Address: TW Hsinchu
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: TW94124036A 20050715
- Main IPC: H01L29/04
- IPC: H01L29/04 ; H01L29/15 ; H01L31/036
Abstract:
A sequential lateral solidification (SLS) mask comprises a plurality of parallelizing repeat patterns. Each of the patterns further comprises a major symmetrical axis and a short axis, and each of the patterns is also composed of first units and second units, in which both the first unit and the second unit comprise respectively a plurality of light transmitting portions and light absorption portions. The first units are positioned in mirror symmetry to the second units via the major symmetrical axis.
Public/Granted literature
- US20070026648A1 Sequential lateral solidification mask Public/Granted day:2007-02-01
Information query
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