Invention Grant
- Patent Title: ESD protection device
- Patent Title (中): ESD保护装置
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Application No.: US11730081Application Date: 2007-03-29
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Publication No.: US07649229B2Publication Date: 2010-01-19
- Inventor: Katsuhiro Kato
- Applicant: Katsuhiro Kato
- Applicant Address: JP Tokyo
- Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee: Oki Semiconductor Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Volentine & Whitt, P.L.L.C.
- Priority: JP2006-098235 20060331
- Main IPC: H01L23/60
- IPC: H01L23/60

Abstract:
A semiconductor device capable of preventing an electrostatic surge without increasing a leak current. In the semiconductor device, a protection circuit for protecting an internal circuit is provided between a source line and a ground line. The protection circuit has a protection transistor of which the drain is connected to the source line and the source and gate are connected to the ground line. The protection transistor is configured by integrally forming two types of transistor structural portions. The latter of the transistor structural portions is longer than the former thereof in gate length. In addition, the sum of gate widths of the latter transistor structural portions is larger than the sum of gate widths of the former transistor structural portions.
Public/Granted literature
- US20070230074A1 Semiconductor device Public/Granted day:2007-10-04
Information query
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