Invention Grant
US07649244B2 Vertical semiconductor device having semiconductor zones for improved operability under dynamic processes
有权
具有用于在动态过程下提高可操作性的半导体区域的垂直半导体器件
- Patent Title: Vertical semiconductor device having semiconductor zones for improved operability under dynamic processes
- Patent Title (中): 具有用于在动态过程下提高可操作性的半导体区域的垂直半导体器件
-
Application No.: US11546010Application Date: 2006-10-11
-
Publication No.: US07649244B2Publication Date: 2010-01-19
- Inventor: Franz Josef Niedernostheide , Hans-Joachim Schulze
- Applicant: Franz Josef Niedernostheide , Hans-Joachim Schulze
- Applicant Address: AT Villach
- Assignee: Infineon Technologies Austria AG
- Current Assignee: Infineon Technologies Austria AG
- Current Assignee Address: AT Villach
- Agency: Maginot, Moore & Beck
- Priority: DE102005049506 20051013
- Main IPC: H01L29/74
- IPC: H01L29/74

Abstract:
A vertical semiconductor device comprises a semiconductor body, a first contact and a second contact, wherein a first semiconductor region of a first conductivity type, a second semiconductor region of a second conductivity type and a third semiconductor region of a second conductivity type are formed in the semiconductor body in a direction from the first contact to the second contact, wherein a basic doping density of the second semiconductor region is smaller than a doping density of the third semiconductor region, and wherein in the second semiconductor region a semiconductor zone of the second conductivity type is arranged in which the doping density is increased relative to the basic doping density of the second semiconductor region.
Public/Granted literature
- US20070120170A1 Vertical semiconductor device Public/Granted day:2007-05-31
Information query
IPC分类: