Invention Grant
US07649581B2 Array substrate of an LCD comprising first and second gate insulating layers and method of fabricating the same
有权
包括第一和第二栅极绝缘层的LCD的阵列衬底及其制造方法
- Patent Title: Array substrate of an LCD comprising first and second gate insulating layers and method of fabricating the same
- Patent Title (中): 包括第一和第二栅极绝缘层的LCD的阵列衬底及其制造方法
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Application No.: US11156476Application Date: 2005-06-21
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Publication No.: US07649581B2Publication Date: 2010-01-19
- Inventor: Young Seok Choi , Byung Yong Ahn , Hong Woo Yu , Ki Sul Cho
- Applicant: Young Seok Choi , Byung Yong Ahn , Hong Woo Yu , Ki Sul Cho
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2004-0060542 20040730
- Main IPC: G02F1/136
- IPC: G02F1/136

Abstract:
Disclosed is an array substrate of an LCD, and a method for fabricating it, which simplifies the fabrication process, thereby reducing fabrication costs. The process is simplified because the array substrate does not have a passivation film. The thin film transistors on the array substrate each have an active layer that is protected from contamination by forming a channel insulation layer on the active layer through a dry-etching process. Further, the gate line, gate pad, and gate electrode may have a two-layer structure having a low-resistance metal layer and a barrier metal layer, or a three-layer structure having a low-resistance metal layer and two barrier metal layers.
Public/Granted literature
- US20060023138A1 Array substrate for LCD and fabrication method thereof Public/Granted day:2006-02-02
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