Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US11321461Application Date: 2005-12-30
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Publication No.: US07649611B2Publication Date: 2010-01-19
- Inventor: Koen Jacobus Johannes Maria Zaal , Jeroen Joost Ottens
- Applicant: Koen Jacobus Johannes Maria Zaal , Jeroen Joost Ottens
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/42
- IPC: G03B27/42 ; G03B27/52 ; G03B27/58
Abstract:
A lithographic apparatus with a cover plate formed separately from a substrate table and means for stabilizing a temperature of the substrate table by controlling the temperature of the cover plate is disclosed. A lithographic apparatus with thermal insulation provided between a cover plate and a substrate table so that the cover plate acts as a thermal shield for the substrate table is disclosed. A lithographic apparatus comprising means to determine a substrate table distortion and improve position control of a substrate by reference to the substrate table distortion is disclosed.
Public/Granted literature
- US20070153244A1 Lithographic apparatus and device manufacturing method Public/Granted day:2007-07-05
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