Invention Grant
US07649635B2 Method for determining a map, device manufacturing method, and lithographic apparatus
有权
用于确定地图的方法，设备制造方法和光刻设备
- Patent Title: Method for determining a map, device manufacturing method, and lithographic apparatus
- Patent Title (中): 用于确定地图的方法，设备制造方法和光刻设备
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Application No.: US11907571Application Date: 2007-10-15
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Publication No.: US07649635B2Publication Date: 2010-01-19
- Inventor: Hielke Schoonewelle , Marcus Emile Joannes Boonman , Ralph Brinkhof , Martin Jules Marie-Emile De Nivelle , Jan Stoeten , Erwin Antonius Martinus Van Alphen
- Applicant: Hielke Schoonewelle , Marcus Emile Joannes Boonman , Ralph Brinkhof , Martin Jules Marie-Emile De Nivelle , Jan Stoeten , Erwin Antonius Martinus Van Alphen
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G01B11/24
- IPC: G01B11/24
Abstract:
A method according to one embodiment of the invention includes determining a map of a second part of a substrate belonging to a group of substrates. The method includes measuring a first part of at least one substrate belonging to the group to create an average profile map or average height map and computing a map of the second part of the substrate belonging to the group, based on the average profile map or the average height map. The computed map is stored for use during a later determination of a height or tilt of a substrate from the group.
Public/Granted literature
- US20080046183A1 Method for determining a map, device manufacturing method, and lithographic apparatus Public/Granted day:2008-02-21
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