Invention Grant
- Patent Title: System and method to form unpolarized light
- Patent Title (中): 系统和方法形成非偏振光
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Application No.: US11452435Application Date: 2006-06-14
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Publication No.: US07649676B2Publication Date: 2010-01-19
- Inventor: Johannes Jacobus Matheus Baselmans , Huibert Visser
- Applicant: Johannes Jacobus Matheus Baselmans , Huibert Visser
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Sterne, Kessler, Goldstein & Fox P.L.L.C.
- Main IPC: G02B26/08
- IPC: G02B26/08

Abstract:
A system and method are used to form an unpolarized light beam from a polarized light beam. A system comprises a source of radiation and a unpolarizing system. The source of radiation produces a linear polarized beam. The unpolarizing system has first and second optical paths and splits the linear polarized beam. A first portion of the split beam travels along the first optical path having a first path length. A second portion of the split beam travels along the second optical path having a second, different path length. The first and second portions of the split beam are combined to form the unpolarized beam.
Public/Granted literature
- US20070291372A1 System and method to form unpolarized light Public/Granted day:2007-12-20
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