Invention Grant
- Patent Title: Layout rules for whitespace sensitive literals
- Patent Title (中): 空白敏感文字的布局规则
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Application No.: US11201779Application Date: 2005-08-11
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Publication No.: US07650573B2Publication Date: 2010-01-19
- Inventor: Henricus Johannes Maria Meijer , Brian C. Beckman
- Applicant: Henricus Johannes Maria Meijer , Brian C. Beckman
- Applicant Address: US WA Redmond
- Assignee: Microsoft Corporation
- Current Assignee: Microsoft Corporation
- Current Assignee Address: US WA Redmond
- Agency: Workman Nydegger
- Main IPC: G06F17/00
- IPC: G06F17/00

Abstract:
Layout rules are provided that enable white-space sensitive literals to be developed within a source program according to arbitrarily defined or virtual margins. In one aspect, a computerized programming system is provided. The system includes a source program having one or more computer program codes or instructions. A rules component enables a virtual margin to be positioned within the source program, where the virtual margin can be offset from a default margin by at least one position in the source program. The rules component enables a plurality of virtual margins to be nested within the source program. This includes allowing deviations in the margin such as a hole to be declared in the virtual margin.
Public/Granted literature
- US20070035421A1 Layout rules for whitespace sensitive literals Public/Granted day:2007-02-15
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