Invention Grant
US07650588B2 Methods and systems for pattern generation based on multiple forms of design data
有权
基于多种形式设计数据的图案生成方法和系统
- Patent Title: Methods and systems for pattern generation based on multiple forms of design data
- Patent Title (中): 基于多种形式设计数据的图案生成方法和系统
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Application No.: US11526864Application Date: 2006-09-26
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Publication No.: US07650588B2Publication Date: 2010-01-19
- Inventor: Lars Ivansen
- Applicant: Lars Ivansen
- Applicant Address: SE Taby
- Assignee: Micronic Laser Systems AB
- Current Assignee: Micronic Laser Systems AB
- Current Assignee Address: SE Taby
- Agency: Harness, Dickey & Pierce, P.L.C.
- Main IPC: G06F17/50
- IPC: G06F17/50 ; G03F1/00 ; G03C5/00
Abstract:
In a pattern generation method, properties of designs are extracted in a mask data preparation system, and the properties are propagated to a lithography write system. A pattern is generated based on fractured design data and the extracted properties. By preserving the design intent to the lithography write system, the fidelity of the pattern replication may improve.
Public/Granted literature
- US20070130558A1 Methods and systems for pattern generation based on multiple forms of design data Public/Granted day:2007-06-07
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