Invention Grant
- Patent Title: Amphiphilic block copolymers for improved flux application
- Patent Title (中): 两亲嵌段共聚物,用于改善助焊剂
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Application No.: US11965661Application Date: 2007-12-27
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Publication No.: US07651020B2Publication Date: 2010-01-26
- Inventor: Linda A. Shekhawat , Anna M. Prakash
- Applicant: Linda A. Shekhawat , Anna M. Prakash
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Konrad Raynes & Victor LLP
- Agent Alan S. Raynes
- Main IPC: B23K31/02
- IPC: B23K31/02 ; B23K35/22

Abstract:
Embodiments include materials which may be used during electronic device fabrication, including a flux material. The flux material comprises a solution including a plurality of micellar structures in a solvent, the micellar structures each including a plurality of amphiphilic block copolymer elements. The amphiphilic block copolymer elements each include at least one non-polar region and at least one polar region. A fluxing agent is contained within the micellar structures. Other embodiments are described and claimed.
Public/Granted literature
- US20090169721A1 AMPHIPHILIC BLOCK COPOLYMERS FOR IMPROVED FLUX APPLICATION Public/Granted day:2009-07-02
Information query
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