Invention Grant
- Patent Title: Noncontract IC tag with non-conductive metal film
- Patent Title (中): 非导电金属薄膜的非标签IC标签
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Application No.: US11604195Application Date: 2006-11-27
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Publication No.: US07651033B2Publication Date: 2010-01-26
- Inventor: Hiroyuki Asakura , Kiyoshi Imaizumi , Takeshi Iihara , Kazuyuki Takasawa , Minoru Komada
- Applicant: Hiroyuki Asakura , Kiyoshi Imaizumi , Takeshi Iihara , Kazuyuki Takasawa , Minoru Komada
- Applicant Address: JP Tokyo
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2005-364235 20051219; JP2006-040544 20060217
- Main IPC: G06K19/06
- IPC: G06K19/06

Abstract:
A noncontact IC tag 1 comprises a base film 11, a noncontact IC circuit 2, 3 formed on the base film 11, and a plastic film or paper serving as a surfacing sheet 4, having a non-conductive, lustrous metal film 6m formed by deposition, laminated to the base film 11 on the side of the noncontact IC tag circuit 2, 3. The surface roughness of the non-conductive, lustrous metal film 6m, determined by atomic force microscopy, is more than 10 nm and 100 nm or less as indicated by the center line average height Ra. In the case where the non-conductive, lustrous metal film 6m is formed on the outer surface of the surfacing sheet 4, a concealing layer 4a may further be formed on the inner surface of the surfacing sheet 4 in order to enhance concealing properties.
Public/Granted literature
- US20070138303A1 Noncontact IC tag with non-conductive metal film Public/Granted day:2007-06-21
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