Invention Grant
- Patent Title: Polishing system with optical head
- Patent Title (中): 抛光系统带光头
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Application No.: US11894785Application Date: 2007-08-20
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Publication No.: US07651385B2Publication Date: 2010-01-26
- Inventor: Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
- Applicant: Dominic J. Benvegnu , Jeffrey Drue David , Bogdan Swedek
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson
- Main IPC: B24B49/00
- IPC: B24B49/00 ; B24B51/00

Abstract:
A polishing system includes a platen, a carrier head to hold a surface of a substrate against a polishing pad on the platen, a monitoring module including a light source and a detector, an optical fiber having a proximate end coupled to the monitoring module and a distal end, and an optical head removably mounted in the platen. The optical head holds the distal end of the optical fiber to direct light through a window in the polishing pad to the surface of the substrate and receive reflected light from the surface of the substrate, and the optical head is configured to adjust a distance from the distal end of the fiber to the window.
Public/Granted literature
- US20080009227A1 Optical head for chemical mechanical polishing Public/Granted day:2008-01-10
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