Invention Grant
- Patent Title: Solid precursor vaporization system for use in chemical vapor deposition
- Patent Title (中): 用于化学气相沉积的固体前体蒸发系统
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Application No.: US11096077Application Date: 2005-03-31
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Publication No.: US07651570B2Publication Date: 2010-01-26
- Inventor: Jozef Brcka
- Applicant: Jozef Brcka
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Wood, Herron & Evans, LLP
- Main IPC: C23C16/00
- IPC: C23C16/00 ; C23C16/448
Abstract:
A solid precursor vaporization system configured for use in a deposition system, such as thermal chemical vapor deposition (TCVD), is described. The solid precursor vaporization system comprises a plurality of concentric solid precursor cylinders supported on a gas distribution plate and configured to provide a substantially constant surface area as solid precursor is consumed.
Public/Granted literature
- US20060219168A1 Solid precursor vaporization system for use in chemical vapor deposition Public/Granted day:2006-10-05
Information query
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