Invention Grant
- Patent Title: Orienting, positioning, and forming nanoscale structures
- Patent Title (中): 定位,定位和形成纳米结构
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Application No.: US12061777Application Date: 2008-04-03
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Publication No.: US07651735B2Publication Date: 2010-01-26
- Inventor: Joy Cheng , Ho-Cheol Kim , Robert D. Miller
- Applicant: Joy Cheng , Ho-Cheol Kim , Robert D. Miller
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Schmeiser, Olsen & Watts
- Main IPC: B05D5/00
- IPC: B05D5/00

Abstract:
Methods and a structure. A first film of a first block copolymer is formed inside a trough integrally disposed on an energetically neutral surface layer of a substrate. Line-forming microdomains are assembled of the first block copolymer, and form first self-assembled structures within the first film normal to the sidewalls and parallel to the surface layer. At least one microdomain is removed from the first film such that oriented structures remain in the trough oriented normal to the sidewalls and parallel to the surface layer. A second film of a second block copolymer is formed inside the trough. Line-forming microdomains are assembled of the second block copolymer, and form second self-assembled structures within the second film oriented normal to the oriented structures and parallel to the sidewalls. A second method and a structure are also provided.
Public/Granted literature
- US20080233343A1 ORIENTING, POSITIONING, AND FORMING NANOSCALE STRUCTURES Public/Granted day:2008-09-25
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