Invention Grant
- Patent Title: Patterned photoacid etching and articles therefrom
- Patent Title (中): 图案化光致酸蚀刻及其制品
-
Application No.: US11756866Application Date: 2007-06-01
-
Publication No.: US07651830B2Publication Date: 2010-01-26
- Inventor: Wayne S Mahoney , Steven D. Theiss
- Applicant: Wayne S Mahoney , Steven D. Theiss
- Applicant Address: US MN St. Paul
- Assignee: 3M Innovative Properties Company
- Current Assignee: 3M Innovative Properties Company
- Current Assignee Address: US MN St. Paul
- Agent Stephen F. Wolf
- Main IPC: G03F7/09
- IPC: G03F7/09 ; G03F7/20 ; G03F7/30 ; G03F7/36 ; G03C1/77
Abstract:
Provided is an article that comprises a substrate comprising an acid-etchable layer, a water-soluble polymer matrix, and a photoacid generator. Also provided is a method for patterning that can provide patterned layers that can be used to form electroactive devices.
Public/Granted literature
- US20080299486A1 Patterned Photoacid Etching and Articles Therefrom Public/Granted day:2008-12-04
Information query
IPC分类:
