Invention Grant
- Patent Title: Optical semiconductor device and method of manufacturing thereof
- Patent Title (中): 光半导体装置及其制造方法
-
Application No.: US11575835Application Date: 2005-09-15
-
Publication No.: US07651887B2Publication Date: 2010-01-26
- Inventor: Yoshitsugu Morita , Tomoko Kato
- Applicant: Yoshitsugu Morita , Tomoko Kato
- Applicant Address: JP Tokyo
- Assignee: Dow Corning Toray Company, Ltd.
- Current Assignee: Dow Corning Toray Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Howard & Howard Attorneys PLLC
- Priority: JP2004-276078 20040922
- International Application: PCT/JP2005/017443 WO 20050915
- International Announcement: WO2006/033375 WO 20060330
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A method of manufacturing an optical semiconductor device (16) sealed in a transparent or semitransparent cured silicone body (50) by placing an unsealed optical semiconductor device (16) into a mold (23, 34) and subjecting a transparent or semitransparent curable silicone composition (50) that fills the spaces between the mold and the unsealed device (70) to compression molding; provides the sealed optical semiconductor device that is free of voids, allows control of the coating layer thickness, protects the bonding wires from breakage and accidental contact, reduces concentration of stress on an optical semiconductor element, has long service life with reducing discoloration and disconnection of the sealing resin from the optical semiconductor element (16), and has excellent reliability.
Public/Granted literature
- US20080070333A1 Optical Semiconductor Device And Method Of Manufacturing Thereof Public/Granted day:2008-03-20
Information query
IPC分类: