Invention Grant
- Patent Title: Fabricating method for thin film transistor array substrate and thin film transistor array substrate using the same
- Patent Title (中): 薄膜晶体管阵列基板和薄膜晶体管阵列基板的制造方法
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Application No.: US11636605Application Date: 2006-12-11
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Publication No.: US07651899B2Publication Date: 2010-01-26
- Inventor: Byoung Ho Lim
- Applicant: Byoung Ho Lim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: McKenna Long & Aldridge LLP
- Priority: KR10-2005-0133548 20051229
- Main IPC: H01L21/00
- IPC: H01L21/00 ; H01L21/84
Abstract:
A method of fabricating a thin film transistor array substrate and a thin film transistor array substrate using the same is disclosed. Picture quality deterioration may be prevented.
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