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US07651902B2 Hybrid substrates and methods for forming such hybrid substrates 失效
混合基板和形成这种混合基板的方法

Hybrid substrates and methods for forming such hybrid substrates
Abstract:
Hybrid substrates characterized by semiconductor islands of different crystal orientations and methods of forming such hybrid substrates. The methods involve using a SIMOX process to form an insulating layer. The insulating layer may divide the islands of at least one of the different crystal orientations into mutually aligned device and body regions. The body regions may be electrically floating relative to the device regions.
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