Invention Grant
US07651913B2 Method of forming non-volatile memory (NVM) retention improvement utilizing protective electrical shield 有权
使用保护电气屏蔽形成非易失性存储器(NVM)保持改进的方法

Method of forming non-volatile memory (NVM) retention improvement utilizing protective electrical shield
Abstract:
An electrical shield is provided in a non-volatile memory (NVM) cell structure to protect the cell's floating gate from any influence resulting from charge redistribution in the vicinity of the floating gate during a programming operation. The shield may be created from the second polysilicon layer or other conductive material covering the floating gate. The shield may be grounded. Alternately, it may be connected to the cell's control gate electrode resulting in better coupling between the floating gate and the control gate. It is not necessary that the shield cover the floating gate completely, the necessary protective effect is achieved if the coupling to the dielectric layers surrounding the floating gate is reduced.
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