Invention Grant
US07651913B2 Method of forming non-volatile memory (NVM) retention improvement utilizing protective electrical shield
有权
使用保护电气屏蔽形成非易失性存储器(NVM)保持改进的方法
- Patent Title: Method of forming non-volatile memory (NVM) retention improvement utilizing protective electrical shield
- Patent Title (中): 使用保护电气屏蔽形成非易失性存储器(NVM)保持改进的方法
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Application No.: US12012545Application Date: 2008-02-04
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Publication No.: US07651913B2Publication Date: 2010-01-26
- Inventor: Yuri Mirgorodski , Peter J. Hopper , Vladislav Vashchenko
- Applicant: Yuri Mirgorodski , Peter J. Hopper , Vladislav Vashchenko
- Applicant Address: US CA Santa Clara
- Assignee: National Semiconductor Corporation
- Current Assignee: National Semiconductor Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Dergosits & Noah LLP
- Main IPC: H01L21/336
- IPC: H01L21/336

Abstract:
An electrical shield is provided in a non-volatile memory (NVM) cell structure to protect the cell's floating gate from any influence resulting from charge redistribution in the vicinity of the floating gate during a programming operation. The shield may be created from the second polysilicon layer or other conductive material covering the floating gate. The shield may be grounded. Alternately, it may be connected to the cell's control gate electrode resulting in better coupling between the floating gate and the control gate. It is not necessary that the shield cover the floating gate completely, the necessary protective effect is achieved if the coupling to the dielectric layers surrounding the floating gate is reduced.
Public/Granted literature
- US20080213959A1 Non-volatile memory (NVM) retention improvement utilizing protective electrical shield Public/Granted day:2008-09-04
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