Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
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Application No.: US12081291Application Date: 2008-04-14
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Publication No.: US07652751B2Publication Date: 2010-01-26
- Inventor: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- Applicant: Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Bob Streefkerk
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03B27/32
- IPC: G03B27/32 ; G03B27/42 ; G03B27/52
Abstract:
A lithographic apparatus and method, in an embodiment for immersion lithography, are disclosed with a single stage in which leveling and exposure are performed simultaneously.
Public/Granted literature
- US20080192219A1 Lithographic apparatus and device manufacturing method Public/Granted day:2008-08-14
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