Invention Grant
- Patent Title: Magneto-resistive or tunneling magneto-resistive element having a shielding film of an amorphous layer above a crystalline layer, and method for manufacturing the same
- Patent Title (中): 具有在结晶层上方的非晶层的屏蔽膜的磁阻或隧道式磁阻元件及其制造方法
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Application No.: US11500311Application Date: 2006-08-08
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Publication No.: US07652854B2Publication Date: 2010-01-26
- Inventor: Takeo Kagami , Naoki Ohta , Kazuki Sato , Satoshi Miura
- Applicant: Takeo Kagami , Naoki Ohta , Kazuki Sato , Satoshi Miura
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-230417 20050809
- Main IPC: G11B5/33
- IPC: G11B5/33

Abstract:
A tunneling magneto-resistive element includes: a tunneling magneto-resistive film including an antiferromagnetic layer, a pinned layer, a barrier layer and a free layer; and a lower magnetic shielding film disposed below the tunneling magneto-resistive film with respect to a lamination direction. The barrier layer is constituted of magnesium oxide. The lower magnetic shielding film has a multi-layer structure including a crystalline layer and an amorphous layer disposed above the crystalline layer with respect to the lamination direction. The crystalline layer contains at least one crystal grain having a grain size of 500 nm or more.
Public/Granted literature
- US20070035886A1 Magneto-resistive element, tunneling magneto-resistive element and method for manufacturing the same Public/Granted day:2007-02-15
Information query
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