Invention Grant
- Patent Title: Magnetoresistance effect element and magnetic memory
- Patent Title (中): 磁阻效应元件和磁存储器
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Application No.: US11608969Application Date: 2006-12-11
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Publication No.: US07652913B2Publication Date: 2010-01-26
- Inventor: Hideyuki Sugiyama , Yoshiaki Saito , Tomoaki Inokuchi
- Applicant: Hideyuki Sugiyama , Yoshiaki Saito , Tomoaki Inokuchi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2006-023337 20060131
- Main IPC: G11C11/00
- IPC: G11C11/00

Abstract:
It is made possible to cause spin inversion at a low current density which does not cause element destruction and to conduct writing with a small current. A magnetoresistance effect element includes: a magnetization pinned layer in which magnetization direction is pinned; a magnetic recording layer in which magnetization direction is changeable, the magnetization direction in the magnetization pinned layer forming an angle which is greater than 0 degree and less than 180 degrees with a magnetization direction in the magnetic recording layer, and the magnetization direction in the magnetic recording layer being inverted by injecting spin-polarized electrons into the magnetic recording layer; and a non-magnetic metal layer provided between the magnetization pinned layer and the magnetic recording layer.
Public/Granted literature
- US20070177421A1 MAGNETORESISTANCE EFFECT ELEMENT AND MAGNETIC MEMORY Public/Granted day:2007-08-02
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