Invention Grant
- Patent Title: Method for improving the reproducibility of a coordinate measuring apparatus and its accuracy
- Patent Title (中): 提高坐标测量装置再现性及其精度的方法
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Application No.: US12154785Application Date: 2008-05-27
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Publication No.: US07654007B2Publication Date: 2010-02-02
- Inventor: Michael Heiden , Klaus Rinn , Andreas Schaaf
- Applicant: Michael Heiden , Klaus Rinn , Andreas Schaaf
- Applicant Address: DE Weilburg
- Assignee: Vistec Semiconductor Systems GmbH
- Current Assignee: Vistec Semiconductor Systems GmbH
- Current Assignee Address: DE Weilburg
- Agency: Davidson, Davidson & Kappel, LLC
- Priority: DE102007025304 20070530
- Main IPC: G01B11/03
- IPC: G01B11/03 ; G01B11/27

Abstract:
A method for improving the reproducibility of a coordinate measuring machine and its accuracy is disclosed. Using at least one measuring field of a camera, a plurality of images of at least one structure on the substrate are recorded. The substrate is placed on a measuring stage traversable in the X coordinate direction and the Y coordinate direction, the position of which is determined during imaging using a displacement measuring system. The measuring field is displaced by the amount of the deviation determined.
Public/Granted literature
- US20080295348A1 Method for improving the reproducibility of a coordinate measuring apparatus and its accuracy Public/Granted day:2008-12-04
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