Invention Grant
US07654433B2 Flux overspray removal masks with channels, methods of assembling same, and systems containing same
失效
具有通道的助焊剂喷涂去除掩模，其组装方法以及含有其的体系
- Patent Title: Flux overspray removal masks with channels, methods of assembling same, and systems containing same
- Patent Title (中): 具有通道的助焊剂喷涂去除掩模，其组装方法以及含有其的体系
-
Application No.: US11612642Application Date: 2006-12-19
-
Publication No.: US07654433B2Publication Date: 2010-02-02
- Inventor: Sabina J. Houle , Joel Williams
- Applicant: Sabina J. Houle , Joel Williams
- Applicant Address: US CA Santa Clara
- Assignee: Intel Corporation
- Current Assignee: Intel Corporation
- Current Assignee Address: US CA Santa Clara
- Agency: Schwegman, Lundberg & Woessner, P.A.
- Main IPC: B23K1/20
- IPC: B23K1/20 ; B23K20/14
Abstract:
Some embodiments include an apparatus comprising a spray head to spray a substrate, the substrate having a region to be sprayed and a region to be masked, the two regions separated by a boundary, and a mask having channels, the mask located between the spray head and the substrate. In an embodiment, the mask further has a lip to prevent flux overspray from falling onto a substrate below. In an embodiment, flux overspray removal is assisted with a vacuum system. Other embodiments are described and claimed.
Public/Granted literature
- US20080145540A1 FLUX OVERSPRAY REMOVAL MASKS WITH CHANNELS, METHODS OF ASSEMBLING SAME, AND SYSTEMS CONTAINING SAME Public/Granted day:2008-06-19
Information query
IPC分类:
