Invention Grant
- Patent Title: Diaphragm
- Patent Title (中): 隔膜
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Application No.: US11206136Application Date: 2005-08-18
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Publication No.: US07654757B2Publication Date: 2010-02-02
- Inventor: Tetsuya Okumura
- Applicant: Tetsuya Okumura
- Applicant Address: JP Saitama-Shi
- Assignee: Fujinon Corporation
- Current Assignee: Fujinon Corporation
- Current Assignee Address: JP Saitama-Shi
- Agency: Young & Thompson
- Priority: JP2004-257683 20040903
- Main IPC: G03B9/02
- IPC: G03B9/02
Abstract:
A diaphragm comprising a single plate, the single plate comprising: a first plate portion having an aperture; and a second plate portion formed at an outer side of the first plate portion, wherein a first thickness of the first plate portion is thinner than a second thickness of the second plate portion.
Public/Granted literature
- US20060051085A1 Diaphragm Public/Granted day:2006-03-09
Information query
