Invention Grant
US07655089B2 Process and apparatus for producing a single crystal of semiconductor material 有权
用于制造半导体材料的单晶的工艺和设备

  • Patent Title: Process and apparatus for producing a single crystal of semiconductor material
  • Patent Title (中): 用于制造半导体材料的单晶的工艺和设备
  • Application No.: US12242080
    Application Date: 2008-09-30
  • Publication No.: US07655089B2
    Publication Date: 2010-02-02
  • Inventor: Wilfried von Ammon
  • Applicant: Wilfried von Ammon
  • Applicant Address: DE Munich
  • Assignee: Siltronic AG
  • Current Assignee: Siltronic AG
  • Current Assignee Address: DE Munich
  • Agency: Brooks Kushman P.C.
  • Priority: DE10204178 20020201
  • Main IPC: C30B15/02
  • IPC: C30B15/02
Process and apparatus for producing a single crystal of semiconductor material
Abstract:
A process for producing a single crystal of semiconductor material, in which fractions of a melt, are kept in liquid form by a pulling coil, solidify on a seed crystal to form the growing single crystal, and granules are melted in order to maintain the growth of the single crystal. The melting granules are passed to the melt after a delay. There is also an apparatus which Is suitable for carrying out the process and has a device which delays mixing of the molten granules and of the melt.
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