Invention Grant
- Patent Title: Formation of single-crystal silicon carbide
- Patent Title (中): 形成单晶碳化硅
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Application No.: US10514159Application Date: 2003-05-15
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Publication No.: US07655091B2Publication Date: 2010-02-02
- Inventor: Roland Madar , Michel Pons , Francis Baillet , Ludovic Charpentier , Etienne Pernot , Didier Chaussende , Daniel Turover
- Applicant: Roland Madar , Michel Pons , Francis Baillet , Ludovic Charpentier , Etienne Pernot , Didier Chaussende , Daniel Turover
- Applicant Address: FR Paris
- Assignee: Centre National de la Recherche Scientifique
- Current Assignee: Centre National de la Recherche Scientifique
- Current Assignee Address: FR Paris
- Agency: Howard IP Law Group, PC
- Priority: FR0205967 20020515
- International Application: PCT/FR03/01480 WO 20030515
- International Announcement: WO03/097905 WO 20031127
- Main IPC: C30B15/30
- IPC: C30B15/30 ; C23C16/00

Abstract:
The invention concerns a device (10) for forming in single-crystal state a compound body with incongruent evaporation, capable of being in monocrystalline or polycrystalline form, comprising at least one first chamber (20) containing a substrate (42) whereat is formed a polycrystalline source of said body and a monocrystalline germ (46) of said body; a second chamber (14), said substrate being arranged between the two chambers; means for input (36) of gaseous precursors of said body into the second chamber capable of bringing about deposition of said body in polycrystalline form on the substrate; and heating means (26) for maintaining the substrate at a temperature higher than the temperature of the germ so as to bring about sublimation of the polycrystalline source and the deposition on the germ of said body in monocrystalline form.
Public/Granted literature
- US20050257734A1 Formation of single-crystal silicon carbide Public/Granted day:2005-11-24
Information query
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