Invention Grant
US07655094B2 Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates
有权
对用于清洁集成电路基板的清洁溶液进行充电的系统和方法
- Patent Title: Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates
- Patent Title (中): 对用于清洁集成电路基板的清洁溶液进行充电的系统和方法
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Application No.: US10886785Application Date: 2004-07-07
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Publication No.: US07655094B2Publication Date: 2010-02-02
- Inventor: Suraj Puri
- Applicant: Suraj Puri
- Applicant Address: US CA Los Altos
- Assignee: Nano Om, LLC
- Current Assignee: Nano Om, LLC
- Current Assignee Address: US CA Los Altos
- Agency: EcoTech Law Group, P.C.
- Main IPC: B08B7/00
- IPC: B08B7/00
Abstract:
Inventive methods, systems and compositions of cleaning integrated circuit (“IC”) substrates are described. The cleaning methods of the present invention include: charging a solution, which contains at least a solute selected to promote cleaning of the IC substrate, to produce a charged solution, such that at least a portion of the solute is present as clusters in the charged solution; and conveying the charged solution for cleaning the IC substrate.
Public/Granted literature
- US20060019849A1 Systems and methods for charging a cleaning solution used for cleaning integrated circuit substrates Public/Granted day:2006-01-26
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