Invention Grant
- Patent Title: Phase formation of oxygen reduced valve metal oxides and granulation methods
- Patent Title (中): 氧还原阀金属氧化物的相形成和造粒方法
-
Application No.: US10786621Application Date: 2004-02-25
-
Publication No.: US07655214B2Publication Date: 2010-02-02
- Inventor: David M. Reed , Sridhar Venigalla , Jeffrey A. Kerchner
- Applicant: David M. Reed , Sridhar Venigalla , Jeffrey A. Kerchner
- Applicant Address: US MA Boston
- Assignee: Cabot Corporation
- Current Assignee: Cabot Corporation
- Current Assignee Address: US MA Boston
- Main IPC: C01G33/00
- IPC: C01G33/00 ; C22C29/12 ; H01G9/042 ; C01B13/14
Abstract:
Valve metal suboxides having a primary suboxide phase and optionally a secondary suboxide phase, a valve metal phase, and/or at least one tertiary suboxide phase can be present in varying amounts. Also disclosed is anodes and capacitors containing the valve metal suboxides of the present invention. Also, a method to prepare a valve metal suboxide is further described which includes granulating one or more of the starting materials individually or together and/or granulating the final product.
Public/Granted literature
- US20050008564A1 Phase formation of oxygen reduced valve metal oxides and granulation methods Public/Granted day:2005-01-13
Information query
IPC分类:
