Invention Grant
- Patent Title: Method of forming patterned film
- Patent Title (中): 形成图案膜的方法
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Application No.: US11699549Application Date: 2007-01-30
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Publication No.: US07655282B2Publication Date: 2010-02-02
- Inventor: Akifumi Kamijima
- Applicant: Akifumi Kamijima
- Applicant Address: JP Tokyo
- Assignee: TDK Corporation
- Current Assignee: TDK Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff & Berridge, PLC
- Priority: JP2002-222799 20020731
- Main IPC: C23C14/16
- IPC: C23C14/16

Abstract:
A method of forming a patterned thin film comprises the step of forming a frame having an undercut near the bottom thereof on an electrode film, and the plating step of forming the patterned thin film by plating through the use of the frame. The patterned thin film includes a plurality of linear portions disposed side by side. Each of the linear portions has a portion close to the electrode film. This portion has a width greater than the width of the remaining portion of each of the linear portions.
Public/Granted literature
- US20070122553A1 Method of forming patterned film Public/Granted day:2007-05-31
Information query
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