Invention Grant
- Patent Title: Wettability variable substrate and wettability variable layer forming composition
- Patent Title (中): 润湿性可变基质和润湿性变层形成组合物
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Application No.: US10610126Application Date: 2003-06-30
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Publication No.: US07655365B2Publication Date: 2010-02-02
- Inventor: Kaori Yamashita , Hironori Kobayashi
- Applicant: Kaori Yamashita , Hironori Kobayashi
- Applicant Address: JP Tokyo-to
- Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee: Dai Nippon Printing Co., Ltd.
- Current Assignee Address: JP Tokyo-to
- Agency: Ladas & Parry LLP
- Priority: JP2002-192317 20020701
- Main IPC: G03F7/038
- IPC: G03F7/038 ; G03F7/20

Abstract:
It is a main object of the present invention to provide a wettability variable substrate provided with a wettability variable layer which is free from any cloud and is superior in adhesion to a substrate, transparency and liquid repellency. The above object is attained by the provision of a wettability variable substrate comprising a wettability variable layer, on a substrate, which the wettability is varied by exposing to light in the presence of a photocatalyst, wherein the wettability variable layer contains an organopolysiloxane which is a co-hydrolysis condensation polymer obtained using (A) one type or two or more types of organopolysiloxane precursors represented by YnSiX(4-n) (Y represents an alkyl group or a fluoroalkyl group, or a substituent containing these groups, X represents an alkoxyl group, an acetyl group or a halogen, a letter n subscripted to Y and a letter n in (4-n) subscripted to X are an integer from 1 to 3), and (B) an amorphous silica precursor represented by SiX4 (X is the same as above) by a mass ratio of (A)/(B)=1/0.1 to 1/20.
Public/Granted literature
- US20040132946A1 Wettability variable substrate and wettability variable layer forming composition Public/Granted day:2004-07-08
Information query
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