Invention Grant
- Patent Title: Lithographic apparatus and device manufacturing method
- Patent Title (中): 平版印刷设备和器件制造方法
-
Application No.: US11384824Application Date: 2006-03-21
-
Publication No.: US07655367B2Publication Date: 2010-02-02
- Inventor: Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
- Applicant: Erik Petrus Buurman , Thomas Josephus Maria Castenmiller , Johannes Wilhelmus Maria Cornelis Teeuwsen , Bearrach Moest , Marc Antonius Maria Haast
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B.V.
- Current Assignee: ASML Netherlands B.V.
- Current Assignee Address: NL Veldhoven
- Agency: Pillsbury Winthrop Shaw Pittman LLP
- Main IPC: G03F9/00
- IPC: G03F9/00 ; G03C5/00

Abstract:
A method and apparatus make use of data representing changes in wavelength of a radiation source to provide control of focal plane position or to provide correction of sensor data. In the first aspect, the wavelength variation data is provided to control systems that control focus by moving apparatus components including, for example, the mask table, the substrate table or optical elements of the projection optical system. In the second aspect, variation data is used in correcting, e.g., focal plane position data measured by an inboard sensor, such as a transmitted image sensor. The two aspects may be combined in a single apparatus or may be used separately.
Public/Granted literature
- US20060227310A1 Lithographic apparatus and device manufacturing method Public/Granted day:2006-10-12
Information query